Spectroscopic studies of the Sn-based droplet laser plasma EUV source

Chiew-Seng Koay; Kazutoshi Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson

doi:10.1117/12.541575

20 May 2004 Spectroscopic studies of the Sn-based droplet laser plasma EUV source

Chiew-Seng Koay, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban, Martin C. Richardson

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.541575
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

We have previously reported encouraging results with a new type of laser plasma source. As a radiation source at 13.5nm spectral band, tin has several advantages over xenon, not the least of which is the number of ion species within the plasma that contribute to the in-band emission. In this paper we report results from spectroscopic measurements of the laser plasma emission from 12 - 19nm from this target, together with hydrodynamic code simulations of the source, towards developing a suitable laser plasma source for EUV lithography.

Citation Download Citation

Chiew-Seng Koay, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban, and Martin C. Richardson "Spectroscopic studies of the Sn-based droplet laser plasma EUV source", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.541575

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