Improvement of deteriorated resolution caused by polarization phenomenon with TARC process

Kouichirou Tsujita; Isao Mita

doi:10.1117/12.534504

28 May 2004 Improvement of deteriorated resolution caused by polarization phenomenon with TARC process

Kouichirou Tsujita, Isao Mita

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.534504
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

As the feature size becomes smaller, the diffracted light angles get larger, which makes polarization phenomenon severer. As the diffracted light angel becomes larger, the contrast of optical image by p-polarization becomes worse than that by s-polarization. So, it is desirable for better resolution that more s-polarization can be absorbed in resist film than p-polarization. As one of the approaches, we investigated the way of controlling the property of an overcoat on resist called TopARC, or TARC. The ratio of dose in resist film by s-polarization to total dose was calculated by simulation and the optical property and thickness of TARC was optimized to make the ratio of s-polarization largest. Experimentally the alternating PSM was used to make the 2 diffracted lights pass through only the outmost area of pupil, which makes the polarization phenomenon most prominent. ArF scanner with 0.75NA was used. The experimental data showed that the exposure latitude was improved by TARC process optimized to compensate polarization phenomenon.

Citation Download Citation

Kouichirou Tsujita and Isao Mita "Improvement of deteriorated resolution caused by polarization phenomenon with TARC process", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.534504

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