Initial assessment of the lithographic impact of the use of hard pellicles: an overview

Peter De Bisschop; Michael K. Kocsis; Richard Bruls; Andrew Grenville; Chris Van Peski

doi:10.1117/12.537530

28 May 2004 Initial assessment of the lithographic impact of the use of hard pellicles: an overview

Peter De Bisschop, Michael K. Kocsis, Richard Bruls, Andrew Grenville, Chris Van Peski

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.537530
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

We have made an experimental study of the use of Hard Pellicles in Optical Lithography. The goal of this work was to verify whether Hard Pellicles could be a viable alternative when soft (organic) pellicle material is not available, as is currently the case in 157 nm lithography. In our study we have compared scanner performance and lithographic results obtained with Hard Pellicles vs. the results without. Most of this work was actually done on a 193 nm scanner; only recently we started a pellicle-purging investigation on a 157 nm scanner. This part of the work is still ongoing. The results obtained so far are positive - we basically found no difference between the with-Hard-Pellicle results vs. the without-Hard-Pellicle results - and have not yielded any lithographic show stopper for their use in production. This paper presents a brief overview of the currently available results.

Citation Download Citation

Peter De Bisschop, Michael K. Kocsis, Richard Bruls, Andrew Grenville, and Chris Van Peski "Initial assessment of the lithographic impact of the use of hard pellicles: an overview", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.537530

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