Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara; Herve Besaucele; Cynthia A. Maley; Vladimir B. Fleurov; Patrick O'Keeffe; Mary E. Haviland; Richard G. Morton; Walter D. Gillespie; Timothy S. Dyer; Bryan Moosman; Robert Poole

doi:10.1117/12.535614

28 May 2004 Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia A. Maley, Vladimir B. Fleurov, Patrick O'Keeffe, Mary E. Haviland, Richard G. Morton, Walter D. Gillespie, Timothy S. Dyer, Bryan Moosman, Robert Poole

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535614
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Since the introduction of the XLA-100 in January 2003, we have built, tested, and shipped a large number of XLA-100 MOPA lasers to microlithography scanner manufacturers. Some systems have already been installed at chip fabrication lines. To ensure product design robustness, we have been performing a long-term system performance test of an XLA-100 laser at Cymer. In this paper, we will report optical performance of the XLA-100 we see during manufacturing final tests, and a summary of the long term testing.

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Toshihiko Ishihara, Herve Besaucele, Cynthia A. Maley, Vladimir B. Fleurov, Patrick O'Keeffe, Mary E. Haviland, Richard G. Morton, Walter D. Gillespie, Timothy S. Dyer, Bryan Moosman, and Robert Poole "Long-term reliable operation of a MOPA-based ArF light source for microlithography", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535614

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