Paper
29 September 2004 Characteristics of diffractive optical element for multispot beam homogenizing
Takayuki Hirai, Keiji Fuse, Kenichi Kurisu, Keiji Ebata
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Abstract
Laser materials processing has been used increasingly over the wide area of electronic industries, especially for drilling microvias in printed circuit boards, and poly-silicon annealing for thin film transistor of liquid crystal display. To increase a processing speed, it has been developed a beam splitting element of a diffractive optical element (DOE). And the other hand, to obtain higher uniformity, because the intensity distribution of laser beam is usually a non-uniform gaussian profile, beam homogenizer of a DOE has recently been developed and introduced to some promising applications. Through the improvement of optical design algorithms, micro-fabrication techniques of a phase pattern of DOE and new method of optical system, it enables to combine its beam splitting function and homogenizing function. It can produce the simultaneous multi-spot homogenized beam. In this investigation, we introduce a concrete design and fabrication result of multi-spot beam homogenizing system for SHG-YAG laser that can convert a gaussian distribution into the plural number of uniformity intensity distribution, and present the possibility of new laser material processing by using such optics.
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Takayuki Hirai, Keiji Fuse, Kenichi Kurisu, and Keiji Ebata "Characteristics of diffractive optical element for multispot beam homogenizing", Proc. SPIE 5525, Laser Beam Shaping V, (29 September 2004); https://doi.org/10.1117/12.557490
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KEYWORDS
Diffractive optical elements

Beam homogenizers

Laser processing

Beam splitters

Laser drilling

Laser development

Beam shaping

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