Paper
30 December 2004 Single crystalline silicon micromirror array for maskless photolithography in protein synthesis systems
Yun-Ho Jang, Kook-Nyung Lee, Dong-Sik Shin, Yoon-Sik Lee, Yong-Kweon Kim
Author Affiliations +
Abstract
This paper presents the design, fabrication, and testing of a single crystalline silicon (SCS) micromirror array (MMA) for peptide synthesis applications. Also, preliminary peptide synthesis experiments are presented for the proof of MMA performance. The application specific MMA had a simple fabrication process (only 3 photomasks), large mirror size (210x210μm2) and proper separation (60um). In order to obtain reliable structure and characteristics, we incorporated silicon on insulator (SOI) wafer and stepper photolithography. To maximize the pull-in voltage uniformity, sequential designing steps were described considering design limitations. The proposed fabrication process showed that the fabrication yield was very high up to 91.3%. The total array size consisted of 16 x 16 mirrors and tilting angle was 8.5° for left side or right side operations. The surface roughness was very low and less than 4 nm. The switching time of 156 μsec was reasonable since the exposure time during peptide synthesis was a few seconds. The fabricated MMA had a little pull-in voltage non-uniformity because of dimensional non-uniformities or fabrication errors. We have implemented an automated pull-in voltage measurement setup for verifying the pull-in voltage variation among the array. The measured pull-in voltage among 256 mirrors had the average of 96.99 V and the standard deviation of 2.12 V. The fabricated and analyzed MMA was adapted to the automatic peptide synthesis system and the peptide synthesis experiments showed that the SCS MMA improved the synthesis performance.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yun-Ho Jang, Kook-Nyung Lee, Dong-Sik Shin, Yoon-Sik Lee, and Yong-Kweon Kim "Single crystalline silicon micromirror array for maskless photolithography in protein synthesis systems", Proc. SPIE 5641, MEMS/MOEMS Technologies and Applications II, (30 December 2004); https://doi.org/10.1117/12.574010
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KEYWORDS
Mirrors

Semiconducting wafers

Silicon

Micromirrors

Electrodes

Optical lithography

Aluminum

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