High-spatial-resolution studies of UV-laser-damage morphology in SiO<sub>2</sub> thin films with artificial defects

Semyon Papernov; Ansgar W. Schmid

doi:10.1117/12.584899

21 February 2005 High-spatial-resolution studies of UV-laser-damage morphology in SiO₂ thin films with artificial defects

Semyon Papernov, Ansgar W. Schmid

Author Affiliations +

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.584899
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

Atomic force microscopy was employed to investigate the morphology of UV, nanosecond-pulsed-laser damage in SiO₂ thin films. Gold nanoparticles, 18.5 nm in diameter and embedded in the film, were used as calibrated absorbing defects. Damage-crater diameter, depth, volume, and cross-sectional profiles were measured as a function of laser fluence and the lodging depth of gold nanoparticles. The results indicate that at laser fluences close to the crater-formation threshold and a lodging depth of a few particle diameters, the dominating regime of the material removal is melting and evaporation. The morphology of craters initiated by deep absorbing defects, with a lodging depth larger than ~10 particle diameters, clearly points to the dominating role of a shock-wave-induced material-removal mechanism. Crater-diameter variation with lodging depth and laser fluence is compared with theoretical predictions.

Citation Download Citation

Semyon Papernov and Ansgar W. Schmid "High-spatial-resolution studies of UV-laser-damage morphology in SiO₂ thin films with artificial defects", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.584899

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