F<sub>2</sub>-laser writing of silica optical waveguides in silicone rubber

Masayuki Okoshi; Jianzhao Li; Peter Robert Herman

doi:10.1117/12.589392

12 April 2005 F₂-laser writing of silica optical waveguides in silicone rubber

Masayuki Okoshi, Jianzhao Li, Peter Robert Herman

Proceedings Volume 5713, Photon Processing in Microelectronics and Photonics IV; (2005) https://doi.org/10.1117/12.589392
Event: Lasers and Applications in Science and Engineering, 2005, San Jose, California, United States

Abstract

F₂-laser writing of silica (SiO₂) optical waveguides has been successfully demonstrated on the surface of silicone [(SiO(CH₃)₂)_n] rubber by the photochemical modification of silicone into silica. The 2-mm-thick silicone rubber was exposed to the 157-nm F₂-laser beam through a thin (~0.2 mm) air layer. A proximity Cr-on-CaF₂ photomask with 8- to 16-micron-wide slits controlled the exposure size to define the width of the silica waveguide. Optimum laser conditions to generate crack-free waveguides with good transparency were found by varying the laser fluence, pulse repetition rate and total exposure. The optimized waveguides were found to guide both red (~635-nm) and infrared (~1550-nm) wavelengths with light end-fired from standard single-mode fiber.

Citation Download Citation

Masayuki Okoshi, Jianzhao Li, and Peter Robert Herman "F₂-laser writing of silica optical waveguides in silicone rubber", Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); https://doi.org/10.1117/12.589392

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