On board polarization measuring instrument for high NA excimer scanner

Toru Fujii; Naonori Kita; Yasushi Mizuno

doi:10.1117/12.598378

10 May 2005 On board polarization measuring instrument for high NA excimer scanner

Toru Fujii, Naonori Kita, Yasushi Mizuno

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.598378
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We developed an instrument for monitoring the polarized illuminator of the ArF scanner. A rotatable retarder and a rotatable analyzer were incorporated in the instrument for polarimetry. The instrument measures polarization state of the polarized illuminator in sufficient accuracy. Stokes parameter of the illumination light incorporated in the ArF scanner was successfully obtained. The measured result showed that the polarization state of the illumination light was controlled well. The instrument is as small and light-weighted as can be installed on board.

Citation Download Citation

Toru Fujii, Naonori Kita, and Yasushi Mizuno "On board polarization measuring instrument for high NA excimer scanner", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.598378

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