Understanding and reduction of defects on finished EUV masks

Ted Liang; Peter Sanchez; Guojing Zhang; Emily Shu; Rajesh Nagpal; Alan Stivers

doi:10.1117/12.604717

10 May 2005 Understanding and reduction of defects on finished EUV masks

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, Alan Stivers

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.604717
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

To reduce the risk of EUV lithography adaptation for the 32nm technology node in 2009, Intel has operated a EUV mask Pilot Line since early 2004. The Pilot Line integrates all the necessary process modules including common tool sets shared with current photomask production as well as EUV specific tools. This integrated endeavor ensures a comprehensive understanding of any issues, and development of solutions for the eventual fabrication of defect-free EUV masks. Two enabling modules for "defect-free" masks are pattern inspection and repair, which have been integrated into the Pilot Line. This is the first time we are able to look at real defects originated from multilayer blanks and patterning process on finished masks over entire mask area. In this paper, we describe our efforts in the qualification of DUV pattern inspection and electron beam mask repair tools for Pilot Line operation, including inspection tool sensitivity, defect classification and characterization, and defect repair. We will discuss the origins of each of the five classes of defects as seen by DUV pattern inspection tool on finished masks, and present solutions of eliminating and mitigating them.

Citation Download Citation

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, and Alan Stivers "Understanding and reduction of defects on finished EUV masks", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.604717

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