6 kHz MOPA light source for 193 nm immersion lithography

Walter D. Gillespie; Toshihiko Ishihara; William N. Partlo; George X. Ferguson; Michael R. Simon

doi:10.1117/12.601664

12 May 2005 6 kHz MOPA light source for 193 nm immersion lithography

Walter D. Gillespie, Toshihiko Ishihara, William N. Partlo, George X. Ferguson, Michael R. Simon

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601664
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Volume production immersion lithography scanners will require new light sources offering increased output power while delivering improved dose stability over a shorter exposure window. Scaling the light source repetition rate from 4 to 6 kHz is the logical step toward meeting those combined requirements. We will present the results of the latest progress towards developing a 193 nm, 6 kHz light-source using Cymer’s proprietary MOPA technology. We will discuss how the design of critical core technology elements, such as the discharge chamber, the solid-state-pulsed-power modules and opto-electronic detectors within the system are modified to handle the higher average power, thermal demands, and speed to support reliable operation up to 6kHz. The XLA platform, which is already used on three generations of 193 nm MOPA light source, allows seamless integration of these improved technology elements into a reliable, proven product platform. We will also report results of the characterization of the optical parameters critical to the lithography process, such as spectral bandwidth and its stability, energy stability and dose stability, up to 6 kHz.

Citation Download Citation

Walter D. Gillespie, Toshihiko Ishihara, William N. Partlo, George X. Ferguson, and Michael R. Simon "6 kHz MOPA light source for 193 nm immersion lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601664

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