In-line monitoring of acid and base contaminants at low ppt levels for 193nm lithography

Roel Gronheid; Rida Al-Horr

doi:10.1117/12.599089

12 May 2005 In-line monitoring of acid and base contaminants at low ppt levels for 193nm lithography

Roel Gronheid, Rida Al-Horr

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.599089
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

In this paper, a technique for in-line monitoring of acid and base contamination is described. The technique is applied to purge gas monitoring and the air at the in- and outlet of the active charcoal filters on an ASML PAS5500/1100 193nm scanner is analyzed. Unparalleled lower detection limits (LDL) were obtained, especially for acid detection, where LDLs below 10ppt for SO_x were achieved. At the inlet high contamination levels (0.5-3ppb) of NO/HONO and SO_x are detected. The filters effectively remove the SO_x contamination. The residual SO_xcontamination could be measured and the average was found to be ~2ppt, corresponding to a filtering efficiency of 99.8%. The filtering efficiency for NO and HONO is significantly lower and was found to be ~98%, which is in agreement with previous reports.¹

Citation Download Citation

Roel Gronheid and Rida Al-Horr "In-line monitoring of acid and base contaminants at low ppt levels for 193nm lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599089

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