Photoresist modulation curves

Anatoly Bourov; Yongfa Fan; Frank C. Cropanese; Bruce W. Smith

doi:10.1117/12.602805

12 May 2005 Photoresist modulation curves

Anatoly Bourov, Yongfa Fan, Frank C. Cropanese, Bruce W. Smith

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.602805
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Photoresist modulation curves are introduced as a quantitative way to characterize the photoresist process performance when used as a detector in a microlithographic system. The new method allows predicting exposure latitude of the photoresist process across a wide range of resolutions and modulation levels of the aerial image. The data collection process is demonstrated using an immersion interference system, capable of variable resolution and full control over the modulation of the delivered aerial image.

Citation Download Citation

Anatoly Bourov, Yongfa Fan, Frank C. Cropanese, and Bruce W. Smith "Photoresist modulation curves", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.602805

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