Paper
23 March 2005 Lineselective CO2-lasers with variable line-spacing and variable reflectivity silicon gratings
Roland Schulz, Martin Collischon, Hans Brand, Lorenz-Peter Schmidt
Author Affiliations +
Proceedings Volume 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2005) https://doi.org/10.1117/12.611037
Event: XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2004, Prague, Czech Republic
Abstract
A lineselective CO2-laser with an unstable resonator is presented. The CO2-laser is realised with an rf-excited slab geometry to get a compact design with high output power. As lineselective element a grating in Littrow mount is used. The gratings are manufactured by anisotropic etching of silicon. The grating has a variable duty cycle to obtain a variable reflectivity. Furthermore, gratings are presented that have focusing propteries by a variation of the grating periodicity.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roland Schulz, Martin Collischon, Hans Brand, and Lorenz-Peter Schmidt "Lineselective CO2-lasers with variable line-spacing and variable reflectivity silicon gratings", Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); https://doi.org/10.1117/12.611037
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Cited by 3 scholarly publications.
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KEYWORDS
Diffraction gratings

Diffraction

Resonators

Silicon

Reflectivity

Anisotropic etching

Carbon dioxide

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