Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system

K. Reimer; M. Witt; D. Kahler; J. Eichholz; L. Ratzmann; W. Brunger; H.-J, Doring; E. Haugeneder; S. Eder-Kapl; R. Nowak

doi:10.1117/12.637320

16 June 2005 Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system

K. Reimer, M. Witt, D. Kahler, J. Eichholz, L. Ratzmann, W. Brunger, H.-J, Doring, E. Haugeneder, S. Eder-Kapl, R. Nowak

Author Affiliations +

Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637320
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany

Abstract

Objective of this paper is the design and fabrication of the individual plates of the APS. Microsystems Technology is used for aperture chip processing with chip sizes up to 23 mm x 23 mm.

Citation Download Citation

K. Reimer, M. Witt, D. Kahler, J. Eichholz, L. Ratzmann, W. Brunger, H.-J, Doring, E. Haugeneder, S. Eder-Kapl, and R. Nowak "Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637320

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