Photomask pattern viewer and analyzer: HOTSCOPE

Shogo Narukawa; Kiyoshi Yamasaki; Yuji Machiya; Naoya Hayashi

doi:10.1117/12.617155

28 June 2005 Photomask pattern viewer and analyzer: HOTSCOPE

Shogo Narukawa, Kiyoshi Yamasaki, Yuji Machiya, Naoya Hayashi

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617155
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

Recently, photomask pattern feature have become different from LSI layout pattern feature by the OPC process and CMP DUMMY pattern insertion. And then, photomask pattern data volume is very large compared with LSI layout pattern data volume. Therefore, in the usual JOBDECK pattern viewer software, it is difficult to draw those huge pattern data smoothly and quickly. Moreover, various proposals of RET (Resolution Enhancement Technology) are made from various companies and organizations, and it is discussed by various societies. According to the RET, mask pattern feature and structure have been more complicated than the present pattern, and mask difficulty and mask cost might be going to increase and will have great anxiety. Photomask pattern viewer, HOTSCOPE which we developed isn't an only high speed photomask pattern viewer and analyzer, but also can superpose and observe some other mask format pattern and GDS2 format pattern by changing pattern magnification and mirror processing by itself. And HOTSCOPE is the tool which fully incorporated the function required for mask manufactures, such as a plan of a mask, preparation of JOBDECK, and the mask pattern analysis purpose.

Citation Download Citation

Shogo Narukawa, Kiyoshi Yamasaki, Yuji Machiya, and Naoya Hayashi "Photomask pattern viewer and analyzer: HOTSCOPE", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617155

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