Paper
19 August 2005 Ultra-high-resolution DUV microscope optics for semiconductor applications
Author Affiliations +
Abstract
When looking into even modern textbooks on optical design and engineering one can get the impression that everything has already been said about microscope optics. Also at optical conferences microscope optics is at most a marginal topic. Because of this only insiders are aware about the exciting challenges and really amazing achievements in today's state-of-the-art microscope optics. To give an example, this paper will focus on ultra-high resolution DUV microscope objectives for semiconductor inspection and metrology with feature size (half pitch) resolution down to about 60 nm. To meet the performance requirements of such objectives all aspects of optical design and tolerancing, optical coating design, optical production, assembly and image performance assessment have to be matched perfectly to each other at the highest technological level.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Vollrath "Ultra-high-resolution DUV microscope optics for semiconductor applications", Proc. SPIE 5865, Tribute to Warren Smith: A Legacy in Lens Design and Optical Engineering, 58650E (19 August 2005); https://doi.org/10.1117/12.624560
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Cited by 5 scholarly publications.
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KEYWORDS
Deep ultraviolet

Objectives

Microscopes

Microscopy

Photomasks

Metrology

Semiconducting wafers

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