Laser ablation of SiOx thin films for direct mask writing

J. Heber; J. Ihlemann; M. Schulz-Ruhtenberg; J. Schmidt

doi:10.1117/12.625359

5 October 2005 Laser ablation of SiO_x thin films for direct mask writing

J. Heber, J. Ihlemann, M. Schulz-Ruhtenberg, J. Schmidt

Proceedings Volume 5963, Advances in Optical Thin Films II; 596326 (2005) https://doi.org/10.1117/12.625359
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The present study of silica thin films illustrates a new way of direct writing diffractive phase elements by means of UV laser ablation. The concept consists in the conversion of highly absorbing silica layers, which are suitable for laser ablation, into UV transparent structures by thermal annealing, after a direct laser patterning process. This concept has been investigated in detail for several process parameters. As example, a pixel pattern, generated by an appropriate optical design algorithm, is transferred into a phase delay pattern in form of a silica surface relief, which results in a diffractive shaping of a beam transmitted (or reflected) by this structured layer. The direct mask patterning could be achieved at a moderate laser fluence of 350 mJ/cm² with a 248 nm excimer laser.

Citation Download Citation

J. Heber, J. Ihlemann, M. Schulz-Ruhtenberg, and J. Schmidt "Laser ablation of SiO_x thin films for direct mask writing", Proc. SPIE 5963, Advances in Optical Thin Films II, 596326 (5 October 2005); https://doi.org/10.1117/12.625359

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Laser ablation

Thin films

Silica

Annealing

Photomasks

Optical lithography

Excimer lasers

Show All Keywords

Keywords/Phrases

Search In:

Publication Years