Nitrogen-doped TiO<sub>2</sub> thin films grown on various substrates

Tatsunori Sakano; Takeshi Okato; Minoru Obara

doi:10.1117/12.645433

1 March 2006 Nitrogen-doped TiO₂ thin films grown on various substrates

Tatsunori Sakano, Takeshi Okato, Minoru Obara

Proceedings Volume 6106, Photon Processing in Microelectronics and Photonics V; 610615 (2006) https://doi.org/10.1117/12.645433
Event: Lasers and Applications in Science and Engineering, 2006, San Jose, California, United States

Abstract

We demonstrate the effect of N-doping in various phases, where N-doped states, bandgap shifts, and photocatalytic efficiencies are determined. The N-doped TiO₂ films were grown by pulsed-laser deposition using TiON targets. The crystal structures were analyzed using x-ray diffraction and Raman spectroscopy. The crystalline phases of TiO₂ were artificially controlled by choosing appropriate substrates. The anatase and rutile were epitaxially grown on (100) LaAlO₃ and (001) sapphire substrates. Rutile-anatase mixtured phase were grown on soda lime glass substrates. We here note that N-concentration strongly depends on the growth temperature, so that we kept the growth temperature at 300 °C in order to fix the N concentrations for respective specimens. Chemical bonding states of N within the matrix were investigated by x-ray photoelectron spectroscopy. The optical absorption and bandgap were measured using UV-VIS spectrometer. The photocatalytic activity of the films was evaluted by measuring the decompositon rate of methylene blue solution with the visible light illumination.

Citation Download Citation

Tatsunori Sakano, Takeshi Okato, and Minoru Obara "Nitrogen-doped TiO₂ thin films grown on various substrates", Proc. SPIE 6106, Photon Processing in Microelectronics and Photonics V, 610615 (1 March 2006); https://doi.org/10.1117/12.645433

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