Large Area Laser-Assisted Etching of Electronic Materials

Peter D. Brewer; R. M. Osgood Jr.

doi:10.1117/12.956412

7 July 1986 Large Area Laser-Assisted Etching of Electronic Materials

Peter D. Brewer, R. M. Osgood Jr.

Proceedings Volume 0611, Laser Processing of Semiconductors & Hybrids; (1986) https://doi.org/10.1117/12.956412
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States

Abstract

The use of laser assisted-chemistry for dry etching of electronic materials is described. Emphasis is placed on the use of laser-assisted reactions for large area processing. Review of the current technology is given for large area masked etching, UV-projection etching, and laser assisted reactive ion etching (RIE), and plasma etching.

Citation Download Citation

Peter D. Brewer and R. M. Osgood Jr. "Large Area Laser-Assisted Etching of Electronic Materials", Proc. SPIE 0611, Laser Processing of Semiconductors & Hybrids, (7 July 1986); https://doi.org/10.1117/12.956412

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