Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi; Osamu Kakuchi; Kenji Yamazoe; Yoshio Gomei; Todd A. Decker; Michael A. Johnson; Donald W. Phillion; John S. Taylor

doi:10.1117/12.656275

22 March 2006 Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd A. Decker, Michael A. Johnson, Donald W. Phillion, John S. Taylor

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61510E (2006) https://doi.org/10.1117/12.656275
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We have built a visible light point-diffraction interferometer with the purpose to characterize EUVL projection optics. The interferometer operates at the wavelength of 532 nm and utilizes two identical pinhole wavefront reference sources for generation of both signal and reference wavefronts. In the simple configuration of our interferometer, the main source of system error is the pinhole reference wavefronts. It is important that the reference wavefronts are calibrated and the calibration is stable. The calibration using our refractive test optic is reproducible to better than 0.1 nm RMS. The interferometer measured the wavefront of our refractive test optic with the repeatability of 0.1nm RMS. This paper will discuss the error sources and removal of the errors with experimental results.

Citation Download Citation

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd A. Decker, Michael A. Johnson, Donald W. Phillion, and John S. Taylor "Visible light point-diffraction interferometer for testing of EUVL optics", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510E (22 March 2006); https://doi.org/10.1117/12.656275

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