High-sensitivity interferometric schemes for ML2 micromirror calibrations

Jen-Shiang Wang; Olav Solgaard; Andrew R. Neureuther

doi:10.1117/12.656553

23 March 2006 High-sensitivity interferometric schemes for ML2 micromirror calibrations

Jen-Shiang Wang, Olav Solgaard, Andrew R. Neureuther

Proceedings Volume 6151, Emerging Lithographic Technologies X; 615112 (2006) https://doi.org/10.1117/12.656553
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

This paper presents an interferometric method with high sensitivity and good linearity for calibration of micromirror arrays used in maskless lithography. An analytic model based on electric-field perturbation is developed to quantify the influences of mirror configuration and defocus on calibration sensitivity. With the analytic model, two optimization strategies to achieve the highest sensitivity are developed. For a 5-by-5 sub-array with a pixel size of 0.5λ/NA, the sensitivity is improved from 0.0078 I/° when the surrounding pixels are not actuated, to 0.02286 I/° and 0.0347 I/° when the pixels are arranged in optimized schemes at defocus of 0.0RU and 1.5RU, respectively. The typical improvement is about 3X to 4X when the optimized calibration schemes are used.

Citation Download Citation

Jen-Shiang Wang, Olav Solgaard, and Andrew R. Neureuther "High-sensitivity interferometric schemes for ML2 micromirror calibrations", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615112 (23 March 2006); https://doi.org/10.1117/12.656553

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