Study of nano-imprint for sub-100nm patterning by using SU-8 3000NIL resist

Atsushi Sekiguchi; Yoshiyuki Kono; Satoshi Mori; Nao Honda; Yoshihiko Hirai

doi:10.1117/12.656310

24 March 2006 Study of nano-imprint for sub-100nm patterning by using SU-8 3000NIL resist

Atsushi Sekiguchi, Yoshiyuki Kono, Satoshi Mori, Nao Honda, Yoshihiko Hirai

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61512H (2006) https://doi.org/10.1117/12.656310
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

SU-8 (Kayaku Microchem Co., Ltd.) provides well-defined resist profiles with high aspect ratios, and is also suitable for use as a permanent resist. SU-8 has been widely used for many years in the MEMS (Micro Electro Mechanical System), IC package (bump, insulator, encapsulation), micro fluid (inkjet, micro reactor, biochips), and optical device (waveguide, optical switch) fields. SU-8 is a chemically amplified negative resist based on epoxy resin. This resist generates a strong acid during exposure, and PEB (Post Exposure Baking) induces the crosslinking reaction of the resin with the acid working as a catalyst to insolubilize the resist. In our study, we sought to investigate the potential application of SU-8 3000NIL, the most commonly used resist for the MEMS process, to imprint lithography. The results we obtained indicate that SU-8 3000NIL can indeed be applied to imprint lithography after optimizing process conditions for imprinting.

Citation Download Citation

Atsushi Sekiguchi, Yoshiyuki Kono, Satoshi Mori, Nao Honda, and Yoshihiko Hirai "Study of nano-imprint for sub-100nm patterning by using SU-8 3000NIL resist", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512H (24 March 2006); https://doi.org/10.1117/12.656310

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