Micro-stereo-lithography system

T. Yoshimoto; I. Miyaki; H. Yaze; Y. Maruka; N. Ri; T. Teramoto; K. Morohoshi; Y. Koyagi

doi:10.1117/12.657082

24 March 2006 Micro-stereo-lithography system

T. Yoshimoto, I. Miyaki, H. Yaze, Y. Maruka, N. Ri, T. Teramoto, K. Morohoshi, Y. Koyagi

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61513I (2006) https://doi.org/10.1117/12.657082
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We have realized Micro-stereo-lithography technology and system. It can make micro 3D structures more reasonable throughput than existing systems. It has less 2 micron resolutions in the XY directions and 5 micron resolution in the Z layer. We developed a high resolution optical-apparatus, some new photo-polymerizing polymers and a mechanism to coat the thin film of the polymer. Our system can offer various structures with over-hung, hollowed and spiral shape with reasonable resolution and quick turnaround time by maskless technology. We show these results, for example, micro turbine, micro coil and photonic crystal. We hope these technologies will be useful for various fields in the future, for example, nano-imprint, industrial parts and medical fields.

Citation Download Citation

T. Yoshimoto, I. Miyaki, H. Yaze, Y. Maruka, N. Ri, T. Teramoto, K. Morohoshi, and Y. Koyagi "Micro-stereo-lithography system", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513I (24 March 2006); https://doi.org/10.1117/12.657082

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