Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses

Takeshi Higashiguchi; Naoto Dojyo; Masaya Hamada; Keita Kawasaki; Wataru Sasaki; Shoichi Kubodera

doi:10.1117/12.659162

24 March 2006 Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses

Takeshi Higashiguchi, Naoto Dojyo, Masaya Hamada, Keita Kawasaki, Wataru Sasaki, Shoichi Kubodera

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 615145 (2006) https://doi.org/10.1117/12.659162
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We demonstrated a debris-free, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO₂) nano-particles. By using a low SnO₂ concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

Citation Download Citation

Takeshi Higashiguchi, Naoto Dojyo, Masaya Hamada, Keita Kawasaki, Wataru Sasaki, and Shoichi Kubodera "Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615145 (24 March 2006); https://doi.org/10.1117/12.659162

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