Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system

Hans Jasper; Theo Modderman; Mark van de Kerkhof; Christian Wagner; Jan Mulkens; Wim de Boeij; Eelco van Setten; Bernhard Kneer

doi:10.1117/12.657558

15 March 2006 Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system

Hans Jasper, Theo Modderman, Mark van de Kerkhof, Christian Wagner, Jan Mulkens, Wim de Boeij, Eelco van Setten, Bernhard Kneer

Author Affiliations +

Proceedings Volume 6154, Optical Microlithography XIX; 61541W (2006) https://doi.org/10.1117/12.657558
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A second phase in the immersion era is starting with the introduction of ultra high NA (NA >1) systems. These systems are targeting for 45 nm node device production and beyond. ASML TWINSCAN XT:1700i features a maximum NA of 1.2 and a 26x33 mm² scanner field size. The projection lens is an in-line catadioptric lens design and the AERIAL XP illumination system enables conventional an off-axis illumination pupil shapes in either polarized or un-polarized modes at maximum light efficiency. In this paper a description and a performance overview of the TWINSCAN XT:1700i is given. We will present and discuss lithographic performance results, with special attention at low-k1 imaging using high NA and polarized illumination. Overlay, focus and productivity performance will also be presented.

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Hans Jasper, Theo Modderman, Mark van de Kerkhof, Christian Wagner, Jan Mulkens, Wim de Boeij, Eelco van Setten, and Bernhard Kneer "Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system", Proc. SPIE 6154, Optical Microlithography XIX, 61541W (15 March 2006); https://doi.org/10.1117/12.657558

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