Active spectral control of DUV light sources for OPE minimization

Wayne J. Dunstan; Robert Jacques; Robert J. Rafac; Rajasekhar Rao; Fedor Trintchouk

doi:10.1117/12.659283

15 March 2006 Active spectral control of DUV light sources for OPE minimization

Wayne J. Dunstan, Robert Jacques, Robert J. Rafac, Rajasekhar Rao, Fedor Trintchouk

Proceedings Volume 6154, Optical Microlithography XIX; 61542J (2006) https://doi.org/10.1117/12.659283
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The variation of CD with pitch, or Optical Proximity Effect (OPE), in an imaging system shows a behavior that is characteristic of the imaging and process conditions and is sensitive to variations in those conditions. Maintaining stable process conditions can improve the effectiveness of mask Optical Proximity Correction (OPC). One of the factors which affects the OPE is the spectral bandwidth of the light source. To date, passive bandwidth stabilization techniques have been effective in meeting OPE control requirements. However, future tighter OPE specifications will require advanced bandwidth control techniques. This paper describes developments in active stabilization of bandwidth in Cymer XLA and 7010 lasers. State of the art on board metrology, used to accurately measure E95 bandwidth, has enabled a new array of active control solutions to be deployed. Advanced spectral engineering techniques, including sophisticated control algorithms, are used to stabilize and regulate the bandwidth of the light source while maintaining other key performance specifications.

Citation Download Citation

Wayne J. Dunstan, Robert Jacques, Robert J. Rafac, Rajasekhar Rao, and Fedor Trintchouk "Active spectral control of DUV light sources for OPE minimization", Proc. SPIE 6154, Optical Microlithography XIX, 61542J (15 March 2006); https://doi.org/10.1117/12.659283

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