Photomask dry-etching techniques for hard mask

Sung-Won Kwon; Young-Ju Park; Sung-Yoon Kim; Han-shin Lee; Hyuk-Joo Kwon; Seung-Woon Choi; Woo-Sung Han

doi:10.1117/12.681756

20 May 2006 Photomask dry-etching techniques for hard mask

Sung-Won Kwon, Young-Ju Park, Sung-Yoon Kim, Han-shin Lee, Hyuk-Joo Kwon, Seung-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62831T (2006) https://doi.org/10.1117/12.681756
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

A photomask dry etch process typically uses chlorine and oxygen plasma for chrome etching with resist masking. This gas mixture leads macro- and micro-loading as different pattern density with mask-to-mask and within a mask. Thus, there have been several approaches to reduce chrome etch loading by changing etch chemistry, etch conditions and mask materials. Using hard mask material on the chrome layer can minimize chrome etch loading and reduce chrome etch bias. In this paper, chrome etch characteristics which use hard mask materials is investigated.

Citation Download Citation

Sung-Won Kwon, Young-Ju Park, Sung-Yoon Kim, Han-shin Lee, Hyuk-Joo Kwon, Seung-Woon Choi, and Woo-Sung Han "Photomask dry-etching techniques for hard mask", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831T (20 May 2006); https://doi.org/10.1117/12.681756

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available