Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim; Hyemi Lee; Kanjoon Seo; Dongwook Lee; Yongkyoo Choi; Sunghyun Oh; Oscar Han

doi:10.1117/12.686473

20 October 2006 Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, Photomask Technology 2006; 634944 (2006) https://doi.org/10.1117/12.686473
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

As mask feature size is shrinking, required accuracy and repeatability of mask CD measurement is more severe. CD-SEM which is usually used to measure below 0.5um pattern shows the degradation of repeatability by the sparkle noise. To reduce this, larger ROI (range of interest) is recommended on line and space patterns. But this wide ROI is difficult to use on Hole or isolated patterns. In this paper, anisotropic diffusion filtering method will be introduced to replace the ROI, and evaluated on various patterns such as holes and isolated patterns. It can also reduce the effects of defocus of CD-SEM and enhance the repeatability of CD-SEM. And multi-point CD measurement technique is described to reduce the local CD errors on CD uniformity of mask which is usual on one dimensional CD measurement conventionally. Using these methods, local CD uniformity and global CD uniformity of masks which is the key performance of mask quality can be measured more exactly compared to old CD measurement method. And we can give correct information of mask to reduce global CD uniformity by process tuning such as FEC (Fogging Effect Correction) or development process.

Citation Download Citation

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, and Oscar Han "Multi-point CD measurement method to evaluate pattern fidelity and performance of mask", Proc. SPIE 6349, Photomask Technology 2006, 634944 (20 October 2006); https://doi.org/10.1117/12.686473

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KEYWORDS

Critical dimension metrology

Photomasks

Scanning electron microscopy

Image filtering

Line edge roughness

Anisotropic filtering

Time metrology

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