Characterization of absorption losses in deep UV optical materials

K. Mann; U. Leinhos; B. Schäfer

doi:10.1117/12.696123

15 January 2007 Characterization of absorption losses in deep UV optical materials

K. Mann, U. Leinhos, B. Schäfer

Proceedings Volume 6403, Laser-Induced Damage in Optical Materials: 2006; 64031J (2007) https://doi.org/10.1117/12.696123
Event: Boulder Damage Symposium XXXVIII: Annual Symposium on Optical Materials for High Power Lasers, 2006, Boulder, Colorado, United States

Abstract

Comprehensive calorimetric absorption measurements were performed for CaF₂ crystals at irradiation wavelengths 193 nm and 157 nm. By using samples with different thickness a separation of surface and bulk absorptance could be achieved and thus, single- and two-photon absorption coefficients could be determined. For the surface absorptance, a dependence of the polishing grade of the sample was observed at 193 nm. The presented results support earlier proposed models of the absorption mechanisms in wide band-gap materials. For an assessment of the optical quality of DUV optics, a high-sensitivity wavefront analyzer system based on the Hartmann-Shack principle is employed. The device accomplishes precise online monitoring of wavefront deformations of a collimated test beam transmitted through the laser-irradiated site of a sample. Due to the achieved sub-nm resolution, it can be used as an alternative to interferometric measurements for 'at wavelength' testing of optics, e.g. for on-line registration of thermal lensing effects or compaction in fused silica.

Citation Download Citation

K. Mann, U. Leinhos, and B. Schäfer "Characterization of absorption losses in deep UV optical materials", Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64031J (15 January 2007); https://doi.org/10.1117/12.696123

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