Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

Koen D'havé; Takahiro Machida; David Laidler; Shaunee Cheng

doi:10.1117/12.714255

4 April 2007 Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

Koen D'havé, Takahiro Machida, David Laidler, Shaunee Cheng

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651805 (2007) https://doi.org/10.1117/12.714255
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Monitoring of the focus performance is recognized to be an important part of a periodic scanner health check, but can one simply apply all techniques that have been used for dry scanners to immersion scanners? And if so how do such techniques compare to scanner self-metrology tests that are used to set up the tool? In this paper we look at one specific off-line focus characterization technique, Back Side Chrome (BSC), which we then try to match with results obtained from two self-metrology focus tests, available on the scanner chosen for this work. The latter tests are also used to set up the immersion scanner. We point out a few concerns, discuss their effect and indicate that for each generation of immersion tool one should redo the entire exercise.

Citation Download Citation

Koen D'havé, Takahiro Machida, David Laidler, and Shaunee Cheng "Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651805 (4 April 2007); https://doi.org/10.1117/12.714255

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