New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

Manabu Edamura; Yuichi Kunitomo; Takafumi Morimoto; Satoshi Sekino; Toru Kurenuma; Yukio Kembo; Masahiro Watanabe; Shuichi Baba; Kishio Hidaka

doi:10.1117/12.711676

5 April 2007 New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

Manabu Edamura, Yuichi Kunitomo, Takafumi Morimoto, Satoshi Sekino, Toru Kurenuma, Yukio Kembo, Masahiro Watanabe, Shuichi Baba, Kishio Hidaka

Author Affiliations +

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65183M (2007) https://doi.org/10.1117/12.711676
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A new inline metrology tool utilizing atomic force microscope (AFM) suited for LSI manufacturing at the 45-nm node and beyond has been developed. The developed AFM is featuring both of high-speed wafer processing (throughput: 30 WPH) and high-precision measurement (static repeatability: 0.5nm in 3σ). Several types of carbon nanotube (CNT) probes specially designed for the AFM have also been developed. The combination of Advanced StepIn^TM mode and CNT probes realizes high precision measurement for high-aspect-ratio samples such as photoresist patterns. In Advanced StepIn^TM mode, a probe tip approaches and contacts a sample surface, and then moves away from the surface and toward a new measurement position. A series of these actions is performed in a short time (3.8 ms for single measurement point) full-automatically. Advanced StepIn^TM mode not only ensures gentle probe tip contact and precise measurement of high aspect ratio samples, but also minimum tip wear. CNT probes can provide long term performance, while eliminating the need for probe exchange. The developed AFM also realizes flatness measurement of 10-nm level in a wide area of 40x40-mm maximum. This performance is sufficient for the evaluation of CMP processes at the 45-nm node.

Citation Download Citation

Manabu Edamura, Yuichi Kunitomo, Takafumi Morimoto, Satoshi Sekino, Toru Kurenuma, Yukio Kembo, Masahiro Watanabe, Shuichi Baba, and Kishio Hidaka "New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183M (5 April 2007); https://doi.org/10.1117/12.711676

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