Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer

Zach Reid; Mark Wiltse; Sandy Burgan; Gregory Roche

doi:10.1117/12.714231

5 April 2007 Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer

Zach Reid, Mark Wiltse, Sandy Burgan, Gregory Roche

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65183S (2007) https://doi.org/10.1117/12.714231
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A spatial and temporal thermal image of a lithography cell from resist dispense through develop is obtained with a novel instrumented wafer. The wireless sensing wafer was able detect temperature changes the occurred during the photoresist dispense and exposure steps as well as in the photoresist bake steps.

Citation Download Citation

Zach Reid, Mark Wiltse, Sandy Burgan, and Gregory Roche "Thermal imaging of a lithography cell, including exposure tool, using a self-contained instrumented wafer", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183S (5 April 2007); https://doi.org/10.1117/12.714231

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