New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

Anatoly Grayfer; Frank V. Belanger; Phillip Cate; David Ruede

doi:10.1117/12.712208

5 April 2007 New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

Anatoly Grayfer, Frank V. Belanger, Phillip Cate, David Ruede

Author Affiliations +

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651842 (2007) https://doi.org/10.1117/12.712208
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The authors present results of extensive studies on the chemical behavior of low molecular weight silicon-containing species (LMWS) and associated challenges of their analytical determination and control to prevent adverse influence on critical optical elements of exposure tools. In their paper the authors describe a non-traditional approach to the creation of a TMS gaseous source for filter media development and an engineering solution to the challenge of controlling LMWS - a solution that shows a significant advantage over currently existing approaches.

Citation Download Citation

Anatoly Grayfer, Frank V. Belanger, Phillip Cate, and David Ruede "New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651842 (5 April 2007); https://doi.org/10.1117/12.712208

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