Paper
3 May 2007 First measurement data obtained on the new Vistec LMS IPRO4
Dieter Adam, Artur Boesser, Michael Heiden, Jochen Bender, Frank Laske, Klaus-Dieter Röth
Author Affiliations +
Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330I (2007) https://doi.org/10.1117/12.736972
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Abstract
The development of reticles for the 65nm node is already completed and development is ongoing at the leading edge mask shops for 45nm technology node reticles. The specifications for 45 nm node reticles CD homogeneity, CD mean to target, and registration (Overlay) are much tighter than previous generation reticles. As a result of the new requirements new metrology systems will be required which provide significantly improved measurement performance compared to currently available systems. The Vistec LMS IPRO4 is the new generation registration metrology system under final development. Initial performance data of the alpha tool is reported and the planned major hardware and software improvements are described.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dieter Adam, Artur Boesser, Michael Heiden, Jochen Bender, Frank Laske, and Klaus-Dieter Röth "First measurement data obtained on the new Vistec LMS IPRO4", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330I (3 May 2007); https://doi.org/10.1117/12.736972
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Cited by 9 patents.
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KEYWORDS
Photomasks

Metrology

Reticles

Image registration

Tolerancing

Optics manufacturing

Control systems

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