Nanolithography in evanescent near field by using nano-filmed noble metal layers

Yong Yang; Song Hu; Hanmin Yao; Guanxiao Cheng; Wei Yan

doi:10.1117/12.782841

21 November 2007 Nanolithography in evanescent near field by using nano-filmed noble metal layers

Yong Yang, Song Hu, Hanmin Yao, Guanxiao Cheng, Wei Yan

Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67241A (2007) https://doi.org/10.1117/12.782841
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

Nanolithography has been investigated by using optical proximity exposure in the evanescent near field in nano-filmed noble metals. Sub-diffraction-limited feature size can be resolved by using i-line illumination exposure. Compared with the model of original superlens, we separated the superlens 100nm away from the mask, under the illumination of i-line light, the initial simulation shows that the sub-diffraction-limited feature as small as 60nm linewidth with 120nm pitch can be clearly resolved without hard contact between mask and nano-filmed noble metal. By proper design of the materials and the parameters of nano-filmed layers, better resolution can be realized.

Citation Download Citation

Yong Yang, Song Hu, Hanmin Yao, Guanxiao Cheng, and Wei Yan "Nanolithography in evanescent near field by using nano-filmed noble metal layers", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241A (21 November 2007); https://doi.org/10.1117/12.782841

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