Polymeric material for phase and phase-relief recording with enhancement and sensitivity in UV region

Yuri V. Gritsai; Uladzimir V. Mahilny

doi:10.1117/12.752475

31 July 2007 Polymeric material for phase and phase-relief recording with enhancement and sensitivity in UV region

Yuri V. Gritsai, Uladzimir V. Mahilny

Proceedings Volume 6728, ICONO 2007: Novel Photonics Materials; Optics and Optical Diagnostics of Nanostructures; 67283I (2007) https://doi.org/10.1117/12.752475
Event: The International Conference on Coherent and Nonlinear Optics, 2007, Minsk, Belarus

Abstract

A new material for phase and phase-relief optical recording in the ultraviolet spectral region with postexposure diffusion enhancement has been developed based on poly(methyl methacrylate) doped with aromatic ketones. Advantages of the material are a high enhancement coefficient at significant final refractive index modulation amplitude and good stability.

Citation Download Citation

Yuri V. Gritsai and Uladzimir V. Mahilny "Polymeric material for phase and phase-relief recording with enhancement and sensitivity in UV region", Proc. SPIE 6728, ICONO 2007: Novel Photonics Materials; Optics and Optical Diagnostics of Nanostructures, 67283I (31 July 2007); https://doi.org/10.1117/12.752475

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