Radio frequency magnetron sputtering deposition of borate and phosphate glass films

Lucica Boroica; I. Boroica; E. Rotiu; B. Sava; R. Medianu; Clementina Timus; Dagmar Hülsenberg

doi:10.1117/12.756819

1 August 2007 Radio frequency magnetron sputtering deposition of borate and phosphate glass films

Lucica Boroica, I. Boroica, E. Rotiu, B. Sava, R. Medianu, Clementina Timus, Dagmar Hülsenberg

Proceedings Volume 6785, ROMOPTO 2006: Eighth Conference on Optics; 678524 (2007) https://doi.org/10.1117/12.756819
Event: ROMOPTO 2006: Eighth Conference on Optics, 2006, Sibiu, Romania

Abstract

There are different methods to obtain nanostructured thin films: chemical, physical, electrochemical, PLD and radio frequency deposition. The aim of this study was to establish the influence of the process parameters on the films structure and to improve the technological parameters. B₂O₃ and P₂O₅ vitreous targets have been obtained to be used as targets for r.f. magnetron sputtering. To obtain high quality targets it is necessary to use p.a. purity reagents which are dry mixed, then melt for 2 hours at 1200-1250°C. The melted mixture is poured in the mould. The vitreous materials are characterized by DTA, chemical analysis and x-ray diffraction to check for stoichiometry. The thin films obtained by r.f. magnetron sputtering have been characterized by AFM and SEM. The thickness of the composite films are "in situ" controlled in the range (2-20) nm. It seems that these films could be used as space layers in magnetoresistive superlattices, in spite these are totally amorphous without separations.

Citation Download Citation

Lucica Boroica, I. Boroica, E. Rotiu, B. Sava, R. Medianu, Clementina Timus, and Dagmar Hülsenberg "Radio frequency magnetron sputtering deposition of borate and phosphate glass films", Proc. SPIE 6785, ROMOPTO 2006: Eighth Conference on Optics, 678524 (1 August 2007); https://doi.org/10.1117/12.756819

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