Influence of nanocrystal distribution on electroluminescence from Si+-implanted SiO2 thin films

L. Ding; T. P. Chen; M. Yang; F. R. Zhu

doi:10.1117/12.762617

13 February 2008 Influence of nanocrystal distribution on electroluminescence from Si⁺-implanted SiO₂ thin films

L. Ding, T. P. Chen, M. Yang, F. R. Zhu

Proceedings Volume 6898, Silicon Photonics III; 68980H (2008) https://doi.org/10.1117/12.762617
Event: Integrated Optoelectronic Devices 2008, 2008, San Jose, California, United States

Abstract

Light emitting diodes (LEDs) based on a metal-oxide-semiconductor-like (MOS-like) structure with Si nanocrystals (nc-Si) embedded in SiO₂ have been fabricated with low-energy ion implantation. Under a negative gate voltage as low as ~-5 V, both visible and infrared (IR) electroluminescence (EL) have been observed at room temperature. The EL spectra are found to consist of four Gaussian-shaped luminescence bands with their peak wavelengths at ~460, ~600, ~740, and ~1260 nm, in which the ~600-nm band dominants the spectra. The EL properties have been investigated together with the current transport properties of the Si⁺-implanted SiO₂ films. A systematic study has been carried out on the effect of the Si ion implantation dose and the energy on both the current transport and EL properties. The mechanisms of the origin of the four different EL bands have been proposed and discussed.

Citation Download Citation

L. Ding, T. P. Chen, M. Yang, and F. R. Zhu "Influence of nanocrystal distribution on electroluminescence from Si⁺-implanted SiO₂ thin films", Proc. SPIE 6898, Silicon Photonics III, 68980H (13 February 2008); https://doi.org/10.1117/12.762617

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