Evaluation of OPC test patterns using parameter sensitivity

Brian S. Ward

doi:10.1117/12.774462

17 March 2008 Evaluation of OPC test patterns using parameter sensitivity

Brian S. Ward

Proceedings Volume 6924, Optical Microlithography XXI; 69243S (2008) https://doi.org/10.1117/12.774462
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Test pattern data set filtering based on the concept of parameter sensitivity is proposed to reduce OPC time-to-model requirements. The concept of parameter sensitivity-based filtering is discussed briefly, followed by a methodology to apply the filtering to test pattern sets prior to data measurement along with a number of potential data filtering algorithms. The proposed methodology is then applied to an experimental data set targeted for a 32nm logic process. Qualitative observations are made on the initial data filtering, followed by quantitative metrics based on best-fit models for each of the data filtering algorithms. Results demonstrate that a comparable model is achievable using the proposed data filtering methods and one of the filtering algorithms.

Citation Download Citation

Brian S. Ward "Evaluation of OPC test patterns using parameter sensitivity", Proc. SPIE 6924, Optical Microlithography XXI, 69243S (17 March 2008); https://doi.org/10.1117/12.774462

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