Using composite gratings for optical system characterization through scatterometry

Yu Ben; Jing Xue; Costas J. Spanos

doi:10.1117/12.772785

4 March 2008 Using composite gratings for optical system characterization through scatterometry

Yu Ben, Jing Xue, Costas J. Spanos

Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 69251B (2008) https://doi.org/10.1117/12.772785
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Timely process characterization is crucial in Design for Manufacturing. Scatterometry as a powerful metrology tool can be extended for optical system characterization. In this paper, we show how scatterometry can be used in conjunction with an array of dual-pitch or dual-bar gratings to measure optical aberrations. Multiple pattern designs are presented and compared. A linear model is used to describe the relation between aberration and measurable quantities. Firstprinciple simulation results shows the current approach can simultaneously measure various Zernike coefficients with accuracy ~2 mλ.

Citation Download Citation

Yu Ben, Jing Xue, and Costas J. Spanos "Using composite gratings for optical system characterization through scatterometry", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251B (4 March 2008); https://doi.org/10.1117/12.772785

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available