Paper
29 April 2008 Films with regulated optical and electrophysical parameters
A. E. Akinin, I. S. Borisov, V. V. Chernokogin, Y. A. Kontsevoy, E. A. Mitrofanov, S. B. Simakin, Y. A. Zavadsky
Author Affiliations +
Proceedings Volume 7025, Micro- and Nanoelectronics 2007; 70250Z (2008) https://doi.org/10.1117/12.802426
Event: Micro- and Nanoelectronics 2007, 2007, Zvenigorod, Russian Federation
Abstract
There are proposed methods of film heterostructures deposition by means of a magnetron and an ion source. They make it possible to regulate compositions of film structures and also other parameters, for example refractive indexes, conductivity. It is possible to form a film with preliminary demanded values of parameters in the wide range. Refractive index of films on the base of Ti was varied in the range of values 1.70 . n . 2.45. Conductivity of film structures changed from metal up to high resistance isolator. Diamond . like carbon , SixCy, SixOy, SixOyNz and other kinds of film structures were made by means of an ion source with a cold cathode directly from an ion beam. Refractive index value changed in the range of 1.40 . n . 2.65. It is modified a laser method of end point detection of transparent film deposition process after reaching of a demanded thickness. It has been modified a laser scanning system for wafers and semiconductor structures surfaces investigation. This system can measure parameters at 10000 points on square up to 100 x 100 mm2. It can be used for computer modelling, solar cells and silicon-oninsulator (SOI) structures investigations.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. E. Akinin, I. S. Borisov, V. V. Chernokogin, Y. A. Kontsevoy, E. A. Mitrofanov, S. B. Simakin, and Y. A. Zavadsky "Films with regulated optical and electrophysical parameters", Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 70250Z (29 April 2008); https://doi.org/10.1117/12.802426
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KEYWORDS
Argon

Ions

Refractive index

Titanium

Semiconducting wafers

Carbon

Deposition processes

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