Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe

doi:10.1117/12.796014

19 May 2008 Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70280V (2008) https://doi.org/10.1117/12.796014
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started 4-year program for mask manufacturing cost reduction by total optimization of MDP, mask writing, and mask inspection. The total optimization is accomplished by close relationship and synergism of three fields, MDP, mask writing, and mask inspection. And also, the total optimization will be accomplished by sharing four key items, common data format, good use of repeating patterns, pattern prioritization based on design intent, and parallel processing. In this paper, we describe functions of these four key items in the three fields and present status of development.

Citation Download Citation

Masaki Yamabe "Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280V (19 May 2008); https://doi.org/10.1117/12.796014

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