Coating induced phase aberration in a Schwarzschild objective

Samad Edlou; Lan Sun; Chuck Synborski

doi:10.1117/12.795241

29 August 2008 Coating induced phase aberration in a Schwarzschild objective

Samad Edlou, Lan Sun, Chuck Synborski

Proceedings Volume 7067, Advances in Thin-Film Coatings for Optical Applications V; 706709 (2008) https://doi.org/10.1117/12.795241
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

Phase aberration induced by optical coatings can be a critical factor in image quality. When multilayer thin film high reflectors are used at oblique incidence, the two planes of polarization for the most part have different phase shift. This difference is known as phase retardance and is a function of the angle of incidence, coating design, and the spectral wavelength. Point spread function (PSF) calculation by geometrical ray tracing shows the phase aberration caused by the coating could influence the resolution of the lens system. In this paper we investigate phase retardance of three high reflector coating types and their impact on the final image quality in a Schwarzschild objective.

Citation Download Citation

Samad Edlou, Lan Sun, and Chuck Synborski "Coating induced phase aberration in a Schwarzschild objective", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706709 (29 August 2008); https://doi.org/10.1117/12.795241

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