Closed field magnetron sputtering: new generation sputtering process for optical coatings

D. R. Gibson; I. Brinkley; E. M. Waddell; J. M. Walls

doi:10.1117/12.797152

25 September 2008 Closed field magnetron sputtering: new generation sputtering process for optical coatings

D. R. Gibson, I. Brinkley, E. M. Waddell, J. M. Walls

Proceedings Volume 7101, Advances in Optical Thin Films III; 710108 (2008) https://doi.org/10.1117/12.797152
Event: Optical Systems Design, 2008, Glasgow, Scotland, United Kingdom

Abstract

"Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <±1% is accomplished simply using time, although optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide and carbide films. Benefits of the CFM sputter process are described.

Citation Download Citation

D. R. Gibson, I. Brinkley, E. M. Waddell, and J. M. Walls "Closed field magnetron sputtering: new generation sputtering process for optical coatings", Proc. SPIE 7101, Advances in Optical Thin Films III, 710108 (25 September 2008); https://doi.org/10.1117/12.797152

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