Paper
17 October 2008 Road to a zero degree total temperature range post exposure bake process
Tobias Wähler, Peter Dress
Author Affiliations +
Abstract
With tighter CD uniformity requirements, a tighter temperature control during a Post Exposure Bake (PEB) process for photomask production becomes more and more important. CD non uniformities can be partially ascribed to deficiencies of the measurement devices used for the process qualification of a PEB hotplate system. In this paper, a new routine is proposed to overcome the deficiencies of the measurement devices used, so that further improvement of the hotplate performance becomes possible. Using a 25 point sensor array, we finally achieved a bake performance of the hotplate system described in terms of "real" total temperature range on the mask surface, of 0.4°C during temperature ramp-up and below 0.1°C at steady state for a final mean temperature of 100°C. This is a first step in the right direction towards a temperature range of zero for the bake process.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tobias Wähler and Peter Dress "Road to a zero degree total temperature range post exposure bake process", Proc. SPIE 7122, Photomask Technology 2008, 71220C (17 October 2008); https://doi.org/10.1117/12.801369
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Cited by 1 scholarly publication.
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KEYWORDS
Sensors

Temperature metrology

Standards development

Photomasks

Temperature sensors

Mirrors

Measurement devices

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