Electric field-induced progressive CD degradation in reticles

Gavin C. Rider

doi:10.1117/12.801403

17 October 2008 Electric field-induced progressive CD degradation in reticles

Gavin C. Rider

Proceedings Volume 7122, Photomask Technology 2008; 71220G (2008) https://doi.org/10.1117/12.801403
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

Reticles have been found to be susceptible to damage by the Electric Field induced Migration of chrome (EFM) at field levels >100x lower than those that cause ESD. The experimental quantification data are reviewed briefly and detailed AFM imagery is presented illustrating the nature of the reticle degradation process. The characteristics of EFM and its very low onset threshold have significant implications for the protection of advanced reticles so a new reticle handling methodology is proposed which is designed to minimize the risk of field induced damage.

Citation Download Citation

Gavin C. Rider "Electric field-induced progressive CD degradation in reticles", Proc. SPIE 7122, Photomask Technology 2008, 71220G (17 October 2008); https://doi.org/10.1117/12.801403

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