SiO2/HfO2 multilayers: impact of process parameters and stack geometry on the optical and structural properties

D. Patel; P. Langston; A. Markosyan; E. M. Krous; B. Langdon; F. Furch; B. Reagan; R. Route; M. M. Fejer; J. J Rocca; C. S. Menoni

doi:10.1117/12.804434

30 December 2008 SiO₂/HfO₂ multilayers: impact of process parameters and stack geometry on the optical and structural properties

D. Patel, P. Langston, A. Markosyan, E. M. Krous, B. Langdon, F. Furch, B. Reagan, R. Route, M. M. Fejer, J. J Rocca, C. S. Menoni

Author Affiliations +

Proceedings Volume 7132, Laser-Induced Damage in Optical Materials: 2008; 71320L (2008) https://doi.org/10.1117/12.804434
Event: Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, 2008, Boulder, Colorado, United States

Abstract

We present a complete systematic study on the effect of assist beam energy on SiO₂/HfO₂ quarter wave stacks deposited by dual ion beam sputter (DIBS) deposition. Increasing assist beam energy results in lower surface roughness and reduced micro-crystallinity. The coatings also show reduced mechanical stress. The improvements in the structural properties are accompanied by a reduction in the absorption loss and an increase in the laser resistance to damage at 1 μm.

Citation Download Citation

D. Patel, P. Langston, A. Markosyan, E. M. Krous, B. Langdon, F. Furch, B. Reagan, R. Route, M. M. Fejer, J. J Rocca, and C. S. Menoni "SiO₂/HfO₂ multilayers: impact of process parameters and stack geometry on the optical and structural properties", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320L (30 December 2008); https://doi.org/10.1117/12.804434

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