Electron spin resonance spectroscopy investigation of ion beam sputtered HfO2 and SiO2 thin films

B. Langdon; D. Patel; E. Krous; P. Langston; C. S. Menoni; Michelle Shinn

doi:10.1117/12.804459

30 December 2008 Electron spin resonance spectroscopy investigation of ion beam sputtered HfO₂ and SiO₂ thin films

B. Langdon, D. Patel, E. Krous, P. Langston, C. S. Menoni, Michelle Shinn

Proceedings Volume 7132, Laser-Induced Damage in Optical Materials: 2008; 71320M (2008) https://doi.org/10.1117/12.804459
Event: Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, 2008, Boulder, Colorado, United States

Abstract

In this work we use electron spin resonance (ESR) spectroscopy to investigate defects in dual ion beam sputtered HfO₂ and SiO₂ films. "As-grown" SiO₂ films exhibit an ESR feature consistent with an E' center associated with an oxygen vacancy previously reported. A similar feature with axial symmetry is seen in HfO₂ films. The defect giving rise to the HfO₂ ESR feature is distributed throughout the film. In addition, post process annealing of HfO₂ and SiO₂ films greatly reduces these defects.

Citation Download Citation

B. Langdon, D. Patel, E. Krous, P. Langston, C. S. Menoni, and Michelle Shinn "Electron spin resonance spectroscopy investigation of ion beam sputtered HfO₂ and SiO₂ thin films", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320M (30 December 2008); https://doi.org/10.1117/12.804459

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