Status of DPP EUV sources development for Beta/HVM

Masaki Yoshioka; Peter Zink; Guido Schriever; Marc Corthout

doi:10.1117/12.804687

4 December 2008 Status of DPP EUV sources development for Beta/HVM

Masaki Yoshioka, Peter Zink, Guido Schriever, Marc Corthout

Proceedings Volume 7140, Lithography Asia 2008; 71401F (2008) https://doi.org/10.1117/12.804687
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

XTREME technologies and Philips EUV have provided the majority of available EUV sources based on Discharge Produced Plasma (DPP) technology worldwide since 2003. The fact that all existing prototype scanners make use of DPP sources and that further power scaling and debris mitigation upgrades are made according to plan clearly contributes to the maturity of this technology. We will present the latest status of our tin based DPP sources in the joint development work of XTREME technologies and Philips EUV. Demonstration experiments pave the way for this technology towards the HVM power level.

Citation Download Citation

Masaki Yoshioka, Peter Zink, Guido Schriever, and Marc Corthout "Status of DPP EUV sources development for Beta/HVM", Proc. SPIE 7140, Lithography Asia 2008, 71401F (4 December 2008); https://doi.org/10.1117/12.804687

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available